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Profil bibliographique

Bhaswar Chakrabarti

Informations fournies par OpenAlex. Research Africa ne déduit ni nationalité, ni poste, ni coordonnées personnelles.

85Publications signalées
1543Citations signalées
1Affiliations récentes

Les institutions déclarées

Les domaines associés

Advanced Memory and Neural ComputingFerroelectric and Negative Capacitance DevicesSemiconductor materials and devicesNeuroscience and Neural EngineeringTransition Metal Oxide Nanomaterials

Les publications récentes

Accès ouvert 2026 article OpenAlex

Quantifying Endurance-Driven Loss of Polarization-to-Channel Charge Coupling in HfO2-Based Ferroelectric Field-Effect Transistors

Apu Das, Agniva Paul, Zhao-Feng Lou, Masud Rana SK et autres

Abstract Hafnium-oxide (HfO2)-based ferroelectric field-effect transistors are promising for nonvolatile memory and in-memory computing; however, endurance degradation remains difficult to quantify because polarization switching and charge trapping simultaneously influence the threshold voltage. Here, we combine transfer characteristics, switching-current-derived polarization, capacitance–voltage measurements, and …

tw, in, de (code pays fourni par la source)

0 citations ACS Applied Electronic Materials
2026 article OpenAlex

Interfacial and Bulk Switching MoS 2 Memristors for an All-2D Reservoir Computing Framework

Asmita S. Thool, Sourodeep Roy, Prahalad Kanti Barman, Kartick Biswas et autres

In this study, we report non-filamentary resistance switching with short- and long-term memory dynamics in Au/Ti/MoS 2 /Au memristive devices. The temporal dynamics is engineered by controlling the thickness of the chemical-vapor-deposited (CVD) MoS 2 films. Monolayer (1L)-MoS 2 devices exhibit forming-free …

in, us (code pays fourni par la source)

0 citations ACS Applied Electronic Materials
2026 other OpenAlex

Metal–Oxide Resistive Random‐Access Memory Technology: A Perspective on the Challenges and Opportunities

Bhaswar Chakrabarti, Sourodeep Roy, Shubham Pande, Masud Rana Sk

Metal–oxide-based resistive random-access memory (RRAM) technology belongs to the category of emerging nonvolatile memory technologies (eNVM). First developed in the early 2000s, it has been vigorously investigated as a replacement of Flash memory and has been proposed earlier as a Universal memory …

in (code pays fourni par la source)

0 citations
Accès ouvert 2026 article OpenAlex

Long-term reliability of naturally aged hafnium oxide ferroelectric transistors for energy-efficient embedded memory

Asim Senapati, Apu Das, Agniva Paul, Masud Rana Sk et autres

Ferroelectric field-effect transistors (FeFETs) based on hafnium oxide remain promising for embedded non-volatile memory, yet their long-term stability under realistic storage conditions is not well understood. Here, we examine silicon-doped hafnium oxide FeFETs that have undergone more than 5 years of natural …

tw, in, de, fi, it (code pays fourni par la source)

4 citations Cell Reports Physical Science
Accès ouvert 2026 other OpenAlex

Long-term reliability of naturally aged hafnium oxide ferroelectric transistors for energy-efficient embedded memory

Asim Senapati, Apu Das, Agniva Paul, Masud Rana Sk et autres

Ferroelectric field-effect transistors (FeFETs) based on hafnium oxide remain promising for embedded non-volatile memory, yet their long-term stability under realistic storage conditions is not well understood. Here, we examine silicon-doped hafnium oxide FeFETs that have undergone more than 5 years of natural …

0 citations Fraunhofer-Publica (Fraunhofer-Gesellschaft)
2025 article OpenAlex

A Tunable Capacitance ReRAM for Improvement of Dynamic Range in CMOS Image Sensors

S. Chourasia, S. Pande, Andrea Padovani, Luca Larcher et autres

work reports a tunable-capacitance resistive memory (TCReRAM) device. The TCReRAM uses a binary metal-oxide active-layer and exhibits strong voltage-dependent capacitance (VDC) under appropriate operating conditions. The observed VDC dynamics is characterized experimentally, and its physical origin is investigated through comprehensive multiscale simulations. …

in, it, us (code pays fourni par la source)

0 citations IEEE Electron Device Letters
2025 conference-paper OpenAlex

Many-fold Performance Enhancement of Flexible Capacitive Force Sensor Response using a Thin Graphene Oxide Layer

Shree Harsha Kn, M. Manivannan, Soumya Dutta, Bhaswar Chakrabarti

This paper presents the fabrication and characterization of flexible capacitive force sensors with spin-coated graphene oxide (GO) layers at various rotation per minutes (rpm). GO-modified sensors, based on interdigitated electrode structures on PDMS, are systematically compared to uncoated sensors. Experimental results show …

in (code pays fourni par la source)

0 citations
Accès ouvert 2025 preprint OpenAlex

Long-term reliability of naturally aged hafnium oxide ferroelectric transistors for energy-efficient embedded memory

Asim Senapati, Apu Das, Agniva Paul, Masud Rana Sk et autres

Ferroelectric field-effect transistors based on hafnium oxide remain promising for embedded non-volatile memory, yet their long-term stability under realistic storage conditions is not well understood. Here, we examine silicon-doped hafnium oxide FeFETs that have undergone more than five years of natural aging …

tw, in, de, fi, it (code pays fourni par la source)

0 citations
2025 article OpenAlex

Trapping Dynamics and Endurance in HfO 2 -FeFETs: An Insight From Charge Pumping

Masud Rana Sk, Asim Senapati, Gautham Kumar, Yannick Raffel et autres

We investigate endurance degradation in hafnium oxide (HfO₂)-based ferroelectric field effect transistors (FeFETs) by analyzing interface (Nit) and near-interface oxide traps (Nox) using a two-level charge pumping (CP) technique. After 10⁴ program (PG) / erase (ER) cycles at ±5 V, 100 ns,Nitincreases …

in, tw, de, it (code pays fourni par la source)

6 citations IEEE Electron Device Letters

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