Accès ouvert
2026
article
OpenAlex
Apu Das, Agniva Paul, Zhao-Feng Lou, Masud Rana SK et autres
Abstract Hafnium-oxide (HfO2)-based ferroelectric field-effect transistors are promising for nonvolatile memory and in-memory computing; however, endurance degradation remains difficult to quantify because polarization switching and charge trapping simultaneously influence the threshold voltage. Here, we combine transfer characteristics, switching-current-derived polarization, capacitance–voltage measurements, and …
tw, in, de
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2026
article
OpenAlex
Asmita S. Thool, Sourodeep Roy, Prahalad Kanti Barman, Kartick Biswas et autres
In this study, we report non-filamentary resistance switching with short- and long-term memory dynamics in Au/Ti/MoS 2 /Au memristive devices. The temporal dynamics is engineered by controlling the thickness of the chemical-vapor-deposited (CVD) MoS 2 films. Monolayer (1L)-MoS 2 devices exhibit forming-free …
in, us
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2026
other
OpenAlex
Bhaswar Chakrabarti, Sourodeep Roy, Shubham Pande, Masud Rana Sk
Metal–oxide-based resistive random-access memory (RRAM) technology belongs to the category of emerging nonvolatile memory technologies (eNVM). First developed in the early 2000s, it has been vigorously investigated as a replacement of Flash memory and has been proposed earlier as a Universal memory …
in
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Accès ouvert
2026
conference-paper
OpenAlex
Shubham Pande, Salil Chourasia, Krisha Suthar, Sandeep Kumar et autres
in, it, de
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Accès ouvert
2026
article
OpenAlex
Asim Senapati, Apu Das, Agniva Paul, Masud Rana Sk et autres
Ferroelectric field-effect transistors (FeFETs) based on hafnium oxide remain promising for embedded non-volatile memory, yet their long-term stability under realistic storage conditions is not well understood. Here, we examine silicon-doped hafnium oxide FeFETs that have undergone more than 5 years of natural …
tw, in, de, fi, it
(code pays fourni par la source)
Accès ouvert
2026
other
OpenAlex
Asim Senapati, Apu Das, Agniva Paul, Masud Rana Sk et autres
Ferroelectric field-effect transistors (FeFETs) based on hafnium oxide remain promising for embedded non-volatile memory, yet their long-term stability under realistic storage conditions is not well understood. Here, we examine silicon-doped hafnium oxide FeFETs that have undergone more than 5 years of natural …
2026
article
OpenAlex
S. Chourasia, Sourodeep Roy, S. Chandrasekaran, Firman Mangasa Simanjuntak et autres
in, gb
(code pays fourni par la source)
2025
article
OpenAlex
S. Chourasia, S. Pande, Andrea Padovani, Luca Larcher et autres
work reports a tunable-capacitance resistive memory (TCReRAM) device. The TCReRAM uses a binary metal-oxide active-layer and exhibits strong voltage-dependent capacitance (VDC) under appropriate operating conditions. The observed VDC dynamics is characterized experimentally, and its physical origin is investigated through comprehensive multiscale simulations. …
in, it, us
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2025
conference-paper
OpenAlex
Leela Prashanth Bhimavarapu, Salil Chourasia, Bhaswar Chakrabarti
This work presents an RC-based chaotic variant of Chua’s circuit with a bipolar non-volatile RRAM device as the nonlinear element. The circuit’s electrical behavior is made tunable by programming the internal device state. A Random Number Generator based on the proposed circuit …
in
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2025
conference-paper
OpenAlex
Shree Harsha Kn, M. Manivannan, Soumya Dutta, Bhaswar Chakrabarti
This paper presents the fabrication and characterization of flexible capacitive force sensors with spin-coated graphene oxide (GO) layers at various rotation per minutes (rpm). GO-modified sensors, based on interdigitated electrode structures on PDMS, are systematically compared to uncoated sensors. Experimental results show …
in
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Accès ouvert
2025
preprint
OpenAlex
Asim Senapati, Apu Das, Agniva Paul, Masud Rana Sk et autres
Ferroelectric field-effect transistors based on hafnium oxide remain promising for embedded non-volatile memory, yet their long-term stability under realistic storage conditions is not well understood. Here, we examine silicon-doped hafnium oxide FeFETs that have undergone more than five years of natural aging …
tw, in, de, fi, it
(code pays fourni par la source)
2025
article
OpenAlex
Masud Rana Sk, Asim Senapati, Gautham Kumar, Yannick Raffel et autres
We investigate endurance degradation in hafnium oxide (HfO₂)-based ferroelectric field effect transistors (FeFETs) by analyzing interface (Nit) and near-interface oxide traps (Nox) using a two-level charge pumping (CP) technique. After 10⁴ program (PG) / erase (ER) cycles at ±5 V, 100 ns,Nitincreases …
in, tw, de, it
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