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Profil bibliographique

Kota Ohi

Informations fournies par OpenAlex. Research Africa ne déduit ni nationalité, ni poste, ni coordonnées personnelles.

20Publications signalées
328Citations signalées
1Affiliations récentes

Les institutions déclarées

Les domaines associés

GaN-based semiconductor devices and materialsSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignGa2O3 and related materialsRadio Frequency Integrated Circuit Design

Les publications récentes

2024 article OpenAlex

Latest Technology Trends in Power Semiconductor Devices

Manabu Yoshino, Yujiro Takeuchi, Kota Ohi, Akira Nakajima

Efforts to achieve carbon neutrality are accelerating in order to solve global warming, a worldwide environmental problem. Efficient use of electric energy requires improved performance, higher functionality, and higher quality of power semiconductor devices, which are key components. In recent years, as …

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1 citation IEEJ Transactions on Electronics Information and Systems
2017 conference-paper OpenAlex

Hole path concept for low switching loss and low EMI noise with high IE-effect

Mika Sawada, Yusuke Sakurai, Kota Ohi, Yoshihiro Ikura et autres

This paper presents the “Hole Path Concept” in trench gate IGBTs in order to have extended performance in faster switching with balance low switching loss and low ElectroMagnetic Interference (EMI) noise. The hole path IGBT which is utilized narrow hole extraction regions …

jp (code pays fourni par la source)

29 citations
2016 conference-paper OpenAlex

Trench shielded gate concept for improved switching performance with the low miller capacitance

Mika Sawada, Kota Ohi, Yoshihiro Ikura, Yuichi Onozawa et autres

This paper presents the new gate structure concept in trench gate IGBTs in order to have extended performance in faster switching without penalties on the on-state voltage drop (Von). The combination of the trench gate and adjacent emitter-connected trench achieves the dramatic …

jp (code pays fourni par la source)

25 citations
2014 article OpenAlex

Improved current stability in multi‐mesa‐channel AlGaN/GaN transistors

Joel Tacla Asubar, Kota Ohi, Kenya Nishiguchi, Tamotsu Hashizume

Abstract We present further experimental results that demonstrate the superior current stability of multi‐mesa‐channel (MMC) AlGaN/GaN HEMTs over their conventional planar counterparts. Pulsed ID‐VDS measurements revealed almost overlapping ID‐VDS curves for the MMC device even with increasing drain‐to‐source quiescent bias VDSq with …

jp (code pays fourni par la source)

6 citations Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics
Accès ouvert 2013 article OpenAlex

Current Stability in Multi-Mesa-Channel AlGaN/GaN HEMTs

Kota Ohi, Joel Tacla Asubar, Kenya Nishiguchi, Tamotsu Hashizume

We develop and characterize multi-mesa-channel (MMC) AlGaN/GaN high-electron mobility transistors (HEMTs), in which a periodic trench structure is fabricated only under the gate electrode. A surrounding-field effect in the MMC structure results in a shallower threshold voltage and a smaller subthreshold slope …

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86 citations IEEE Transactions on Electron Devices
2012 article OpenAlex

Reduction of current collapse in the multi‐mesa‐channel AlGaN/GaN HEMT

Kota Ohi, Tamotsu Hashizume

Abstract Transport properties and off‐stress‐induced current collapse characteristics of the multi‐mesa‐channel (MMC) AlGaN/GaN HEMTs were investigated. The surrounding field effect in the MMC structure led to a shallower threshold voltage and a smaller subthreshold slope compared to those of the conventional planar …

jp (code pays fourni par la source)

9 citations Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics
Accès ouvert 2011 article OpenAlex

Formation of Recessed-Oxide Gate for Normally-Off AlGaN/GaN High Electron Mobility Transistors Using Selective Electrochemical Oxidation

Naohisa Harada, Yujin Hori, N. Azumaishi, Kota Ohi et autres

A selective electrochemical oxidation has been applied to the AlGaN surface to fabricate a recessed-oxide-gate structure for normally-off AlGaN/GaN high-electron-mobility transistors (HEMTs). We observed bias-dependent oxidation current characteristics peculiar to the AlGaN/GaN heterostructure. A flat interface between the oxide and AlGaN was …

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27 citations Applied Physics Express
2010 article OpenAlex

Trapping effect evaluation of gateless AlGaN/GaN heterojunction field-effect transistors using transmission-line-model method

Cheng-Yu Hu, Tamotsu Hashizume, Kota Ohi, Masafumi Tajima

An electric-field-dependent trapping effect was observed in our AlGaN/GaN transmission-line-model (TLM) structure. Therefore, we adopted a “gradual voltage stress” scheme to induce a similar trapping effect, that is, a similar sheet resistance variation (ΔRSH) for all intervals of our AlGaN/GaN TLM structure. …

jp (code pays fourni par la source)

6 citations Applied Physics Letters

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