2026
article
OpenAlex
Jiamin Liao, Xiang Zheng, Yibo Wang, Xiaole Jia et autres
In this work, the characteristics of W/Ga2O3 Schottky barrier diodes with Al2O3 passivation under negative bias stress (NBS) are investigated. Interestingly, the NBS treatment yields a significant 91% reduction in reverse leakage current (Ileakage) and a 29.7% enhancement in breakdown voltage (Vbreakdown), …
cn
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2026
article
OpenAlex
Ruiqing Wang, Feng Zhu, Haoji Qian, Jiuren Zhou et autres
Wurtzite ferroelectrics could provide a route to wafer-scale integrated ferroelectric memories but are limited by endurance, typically failing at ~10 8 cycles. We identified nitrogen-vacancy ( V N ) clustering and long-range percolative migration as the defect-mediated pathways that drive leakage-current growth …
cn, hk
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2026
article
OpenAlex
Ruiqing Wang, Jiuren Zhou, Xihui Yuan, Feng Zhu et autres
cn, hk
(code pays fourni par la source)
2026
article
OpenAlex
Xiaole Jia, Shuqi Huang, Yibo Wang, Bochang Li et autres
cn
(code pays fourni par la source)
2026
article
OpenAlex
Yuan Fang, Xiaoxi Li, J J Li, Haiwen Xu et autres
Aluminum scandium nitride (Al1-xScxN) has emerged as a promising candidate for next-generation nonvolatile memories owing to its excellent large remanent polarization (Pr), high Curie temperature, and CMOS compatibility. However, its ferroelectric characteristics are highly sensitive to strain, which limits device scalability. Herein, …
cn
(code pays fourni par la source)
2026
conference-paper
OpenAlex
Chunxiao Yu, Xiang Zheng, Bochang Li, Genquan Han
cn
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2026
article
OpenAlex
Chunxiao Yu, Y N Wu, Yibo Wang, Bochang Li et autres
cn
(code pays fourni par la source)
2026
article
OpenAlex
Qingfang Zhang, Yufeng Ding, Jitao Zhang, Qianyu Chen et autres
Abstract As an insulating medium in electrical equipment, the accurate detection of sulfur hexafluoride (SF6) decomposition products (H2S, SO2, SOF2 and CO) caused by insulation faults is crucial for safe operation of equipment. Although the intrinsic two-dimensional material Ti3C2O2 exhibits affinity toward …
cn
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2026
article
OpenAlex
Xiaole Jia, Shuqi Huang, Yue Wang, Bochang Li et autres
In this work, an NH3plasma treatment (NPT) is introduced to engineer the Al2O3/$\beta $-phase gallium oxide ($\beta $-Ga2O${}_{{3}}\text {)}$interface for high-performance MOS devices. The NPT effectively suppresses Ga suboxide-related surface states, leading to substantial reduction of interface trap density (${D}_{\text {it}}\text {)}$. …
cn
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2026
article
OpenAlex
Qingfang Zhang, Yufeng Ding, Jitao Zhang, Qianyu Chen et autres
cn
(code pays fourni par la source)
Accès ouvert
2026
article
OpenAlex
chunxiao Yu, Yibo Wang, Bochang Li, Chenyu Liu et autres
Abstract In this work, we realized high-performance β -Ga 2 O 3 power MOSFETs grown via metal-organic chemical vapor deposition on sapphire substrates. High-resolution X-ray diffraction and HRTEM characterization confirmed single crystallinity of the β -Ga 2 O 3 heteroepitaxial film on …
cn
(code pays fourni par la source)
2026
article
OpenAlex
Chunxiao Yu, Haodong Hu, Xiang Zheng, Bochang Li et autres
cn
(code pays fourni par la source)