Sophia Schröder

Instrumentation and uncertainty evaluation for absolute characterization of thin films and nanostructured surfaces in advanced optical metrology

Poul‐Erik Hansen, Lauryna Šiaudinytė, Sebastian Heidenreich, Victor Soltwisch et autres

Abstract The importance of traceable measurements is undeniable within an entire metrology community. However, due to their complexity, the optical measurement techniques suffer from the lack of guidelines regarding the measurement uncertainty evaluation. To address this issue, the paper describes the full …

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Broadband reflective spectrometer for high-resolution spectral characterization of radiation sources

Ismael Gisch, Sophia Schröder, Sven Glabisch, Sascha Brose et autres

The development of compact radiation sources for extreme ultraviolet (EUV) radiation has enabled a multitude of lab-size applications, especially in the field of metrology, that were previously only possible at synchrotron facilities. Plasma-based and high-harmonic generation (HHG) sources are widely used and …

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Epidemiology of 7375 children and adolescents hospitalized with COVID-19 in Germany, reported via a prospective, nationwide surveillance study in 2020–2022

Maren Doenhardt, Markus Hufnagel, Natalie Diffloth, Johannes Hübner et autres

By means of a nationwide, prospective, multicenter, observational cohort registry collecting data on 7375 patients with laboratory-confirmed SARS-CoV-2 admitted to children's hospitals in Germany, March 2020-November 2022, our study assessed the clinical features of children and adolescents hospitalized due to SARS-CoV-2, evaluated …

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Laser-driven x-ray generation for industrial applications - A literature- and model-based approach to evaluate brilliance, flux and radiation safety

Jochen Vieker, Rolf Wester, K. Bergmann, Hans-Dieter Hoffmann et autres

A simplified model based on data from literature is presented, to determine the x-ray emission spectrum as function of laser pulse energy, wavelength and peak intensity, to assess applications and radiation safety requirements.

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Nanoscale grating characterization using EUV scatterometry and soft x-ray scattering with plasma and synchrotron radiation

Leonhard M. Lohr, Richard Ciesielski, Sven Glabisch, Sophia Schröder et autres

Modern semiconductor structures reach sizes in the nanometer regime. Optical metrology characterizes test structures for the quality assessment of semiconductor fabrication. The limits of radiation to resolve nanometer structure sizes can be overcome by shortening the wavelength. The compact source extreme ultraviolet …

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Investigation of stochastic roughness effects for nanoscale grating characterization with a stand-alone EUV spectrometer

Sven Glabisch, Sophia Schröder, Sascha Brose, Henning Heiming et autres

Fast and non-destructive non-imaging metrology of nanostructures is crucial for the development of integrated circuits and for the corresponding in-situ metrology within fabrication processes. Stochastic variations related to the gratings local period (line edge roughness, LER) and line width (line width roughness, …

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High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments

Victor Soltwisch, Sven Glabisch, Anna Andrle, Vicky Philipsen et autres

Any modeling of an interaction between photons and matter is based on the optical parameters. The determination of these parameters, also called optical constants or refractive indices, is an indispensable component for the development of new optical elements such as mirrors, gratings, …

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Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet

Sophia Schröder, Lukas Bahrenberg, Bernhard Lüttgenau, Sven Glabisch et autres

Background: In the extreme ultaviolet (EUV) lithography process the performance of the photoresist is a crucial factor regarding the quality and critical dimensions of the fabricated structures. Aim: The characterization of the latent image structures in photoresists during the process steps before …

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Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet

Sophia Schröder, Lukas Bahrenberg, Bernhard Lüttgenau, Sven Glabisch et autres

The authors present latent image characterization in photoresists by means of extreme ultraviolet (EUV) spectroscopic reflectometry. The optical constants of photoresists before and after exposure are measured in the EUV spectral range. Latent images are investigated in the form of periodic line …

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Broadband scatterometry at extreme ultraviolet wavelengths for nanograting characterization

Moein Ghafoori, Lukas Bahrenberg, Sven Glabisch, Sophia Schröder et autres

Characterization of nanoscale gratings by spectroscopic reflectometry in the extreme ultraviolet with a stand-alone setup

Lukas Bahrenberg, Serhiy Danylyuk, Sven Glabisch, Moein Ghafoori et autres

The authors present a study on the dimensional characterization of nanoscale line gratings by spectroscopic reflectometry in the extreme ultraviolet spectral range (5 nm to 20 nm wavelength). The investigated grating parameters include the line height, the line width, the sidewall angle …

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