2025
conference-paper
OpenAlex
Subhali Subhechha, Hongwei Tang, Goutham Arutchelvan, Geert Eneman et autres
Performance of amorphous IGZO thin film transistors is strongly linked to their device architecture and processing. We identify the critical parameters determining device performance across bias ranges through experiments and TCAD simulations. Based on this, we present a process-aware TCAD model describing …
be
(code pays fourni par la source)
2025
conference-paper
OpenAlex
Subhali Subhechha, Nouredine Rassoul, Attilio Belmonte, Adrian Vaisman Chasin et autres
The tremendous surge in the interest in oxide semiconductors for applications such as Flash memories, 3D DRAM, RF circuits, displays, flexible electronics, is driven by the advantages of these materials over conventional choices [1]. Their CMOS back end of line (BEOL) compatibility …
nl
(code pays fourni par la source)
2025
conference-paper
OpenAlex
Daisuke Matsubayashi, Subhali Subhechha, Hyungrock Oh, Nouredine Rassoul et autres
We enable the accurate extraction of the off-current (Ioff) values in capacitor-less 2-transistor (2T0C) DRAM cells by developing two experimental methods for assessing the parasitic capacitance (Cpara). We thus consider the total storage node capacitance (Ctot= CoxRtr+ Cpara) instead of the conventional …
be
(code pays fourni par la source)
2025
conference-paper
OpenAlex
Koji Sakui, Daniele Garbin, Yoshihisa Iwata, Gautam Gaddemane et autres
Dynamic Flash Memory (DFM) have been fabricated on 300 mm SOI wafers with 65 nm technology, experimentally validating a wide "1" and "0" margin for the first time. The proposed device operates exclusively with positive polarity signals, eliminating the need for negative …
be
(code pays fourni par la source)
2025
article
OpenAlex
Anastasiia Kruv, Michiel J. van Setten, Adrian Vaisman Chasin, Daisuke Matsubayashi et autres
Integrating In–Ga–Zn oxide (IGZO) channel transistors into silicon-based ecosystems requires the resilience of the channel material to hydrogen. Standard In-rich IGZO (In = 40 metal at. %) suffers from degradation under forming gas anneal (FGA) and hydrogen-driven positive bias temperature instability (PBTI). …
2025
conference-paper
OpenAlex
S. Van Beek, Adrian Vaisman Chasin, Subhali Subhechha, H.A. Deckers et autres
Reliability in IGZO thin-film transistors (TFT) is known to be limited by Bias Temperature Instability (BTI), however there are no detailed studies on other reliability mechanisms, like dielectric breakdown. We study both bottom-gated and top-gated transistors and find different area scaling trends …
be
(code pays fourni par la source)
Accès ouvert
2025
article
OpenAlex
Hongwei Tang, Dennis Han-Chung Lin, Subhali Subhechha, Adrian Vaisman Chasin et autres
While we demonstrate a back-gated (BG) amorphous Indium-Gallium-Zinc-Oxide (a-IGZO) transistors with a nearly ideal subthreshold slope (SS)$\sim ~60$mV/dec. However, SS degrades when a top-gated (TG) configuration is implemented. The energy distribution of traps inferred from temperature-dependent (T =4 K - 300 K) …
be
(code pays fourni par la source)
2024
conference-paper
OpenAlex
Rishabh Kishore, Swaraj Bandhu Mahato, Subhali Subhechha, Jiwon Lee et autres
We propose a novel 3D Charge Coupled Device (CCD) for high density block addressable buffer memory with IGZO channel and integrable in 3D NAND Flash string architecture. To this purpose, we demonstrate the memory operation using IGZO-based planar 4-phase CCD structure with …
be
(code pays fourni par la source)
Accès ouvert
2020
article
OpenAlex
Xiaoxing Zeng, XU Zhao-di, Xiaofeng Gong, Yiqun Wan
ABSTRACT In this study, Bi(OH) 3 doped with different contents of zinc were successfully prepared via a facile solvothermal approach and characterized by various characterization technologies. The photocat- alytic performance of the obtained samples was evaluated by degradation of Rhodamine B (RhB) …
cn
(code pays fourni par la source)