2025
article
OpenAlex
Amelia Turnquist, Naoyuki Kofuji, Joseph Sebastian, Hiroshi Kou et autres
To investigate the impact of plasma-induced stress on line wiggling, pattern deformation was compared with and without hardmask exposure to the plasma during etching of porous SiOCH (p-SiOCH) with TiN hardmasks of 28 nm pitch. Wiggling occurred in patterns with low residual …
us, jp, be
(code pays fourni par la source)
2023
conference-paper
OpenAlex
Amelia Turnquist, Naoyuki Kofuji, Joseph Sebastian, Zecheng Liu et autres
The impact of both intrinsic and plasma-induced stress of a TiN hardmask on line wiggling was investigated via etching of p-SiOCH with 28 nm pitch, line and space (L/S) EUV resist patterning. Experimental stacks included crystalline PVD TiN with an intrinsic stress …
us, jp, be
(code pays fourni par la source)
2021
conference-paper
OpenAlex
Jonathan P. Laib, Luis Arturo Reyes, Amelia Turnquist, Makoto Satake et autres
Directed self-assembly (DSA) has emerged as one of the most promising, cost-effective paths to continue scaling semiconductor devices down to the sub-10nm regime. While the lithographic guidelines and thermodynamic properties of the block co-polymers ultimately dictate the pitch (typically 20nm+), for full …
us, jp
(code pays fourni par la source)
2019
article
OpenAlex
Jungil Choi, Amay Jairaj Bandodkar, Jonathan T. Reeder, Tyler R. Ray et autres
Real-time measurements of the total loss of sweat, the rate of sweating, the temperature of sweat, and the concentrations of electrolytes and metabolites in sweat can provide important insights into human physiology. Conventional methods use manual collection processes (e.g., absorbent pads) to …
us
(code pays fourni par la source)