Haresh Siriwardane

Modeling for pad wear control during conditioning in CMP

Toshi Kasai, Sriram Anjur, Haresh Siriwardane, Paul Feeney

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Improved Defect Classification Techniques of a Laser Scattering Detection System for Post CMP Silicon Dioxide Wafers

Daniel Mateja, Toshi Kasai, Michael John Denham, Haresh Siriwardane

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Defect Formation in Heavily As-Doped Cz Si

Sergei Rouvimov, R. Kuytt, Joel Kearns, V.R. Todt et autres

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The 3d Parameters Of A (Nano)Crystal From Lattice Images At Two Tilts

Wentao Qin, Haresh Siriwardane, P. Fraundorf

Abstract Various techniques have been developed to infer the 3D relationship of reciprocal lattice vectors from electron diffraction patterns taken at different specimen orientations. Such relationship is subsequently applied in crystallographic analyses. Due to the transmitted nature of the electron beam, TEM …

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Quantitative footprints, in size & number density, of a TEM search for defects in VLSI silicon

Haresh Siriwardane, P. Fraundorf

Electron (and scanning tip) microscopes permit the study of objects over a wide dynamic range of size and number density. When reporting results, null or otherwise, of a microscope search to colleagues wishing to fill in blanks in their image of what …

Finding noise-related artifacts in scanned-probe microscope images

Haresh Siriwardane, P. Fraundorf, L Fei, William J. James et autres

Scanned probe microscope images often contain structure which does not belong to the actual specimen. Some of this structure arises in time-domain instabilities of the microscope and its environment, some of it arises with imperfect attempts of the feedback loop to hold …