2026
article
OpenAlex
Jiamin Liao, Xiang Zheng, Yibo Wang, Xiaole Jia et autres
In this work, the characteristics of W/Ga2O3 Schottky barrier diodes with Al2O3 passivation under negative bias stress (NBS) are investigated. Interestingly, the NBS treatment yields a significant 91% reduction in reverse leakage current (Ileakage) and a 29.7% enhancement in breakdown voltage (Vbreakdown), …
cn
(code pays fourni par la source)
2026
article
OpenAlex
Ruiqing Wang, Feng Zhu, Haoji Qian, Jiuren Zhou et autres
Wurtzite ferroelectrics could provide a route to wafer-scale integrated ferroelectric memories but are limited by endurance, typically failing at ~10 8 cycles. We identified nitrogen-vacancy ( V N ) clustering and long-range percolative migration as the defect-mediated pathways that drive leakage-current growth …
cn, hk
(code pays fourni par la source)
Accès ouvert
2026
preprint
OpenAlex
Zeheng Wang, Yan Liu, Yue Hao, Genquan Han
Semiconductor quantum-device design still lacks an integrated Technology Computer-Aided Design (TCAD)-like environment that connects material geometry, quantum many-body simulation, and automated design. Here we introduce zenDot, a large-language model (LLM)-integrated quantum TCAD platform that links a material-labelled device state to a unified …
2026
article
OpenAlex
Xiaole Jia, Shuqi Huang, Yibo Wang, Bochang Li et autres
cn
(code pays fourni par la source)
Accès ouvert
2026
preprint
OpenAlex
Zeheng Wang, Yan Liu, Yue Hao, Genquan Han
In advanced complementary metal-oxide-semiconductor (CMOS) quantum chips, compact gate stacks make it difficult to connect lithographic geometry, electrostatic confinement and many-electron spin filling in one transparent model. This connection is central to design-technology co-optimization (DTCO). Here we develop a reduced-order analytical framework …
Accès ouvert
2026
preprint
OpenAlex
Zeheng Wang, Yan Liu, Yue Hao, Genquan Han
In advanced complementary metal-oxide-semiconductor (CMOS) quantum chips, compact gate stacks make it difficult to connect lithographic geometry, electrostatic confinement and many-electron spin filling in one transparent model. This connection is central to design-technology co-optimization (DTCO). Here we develop a reduced-order analytical framework …
cn
(code pays fourni par la source)
2026
article
OpenAlex
Weiwen Pan, W T Zhang, Fei Yu, Peiyuan Du et autres
cn
(code pays fourni par la source)
2026
article
OpenAlex
Junru Qu, Jiabao Ye, Dong Liu, Wannian Wang et autres
cn, gb
(code pays fourni par la source)
2026
article
OpenAlex
Xiaomin Yang, Hongrui Zhang, Di Wang, Kai Xiong et autres
cn
(code pays fourni par la source)
2026
article
OpenAlex
Peimin Gu, Xiaoxi Li, Haoji Qian, Jiajia Chen et autres
cn
(code pays fourni par la source)
2026
article
OpenAlex
Peiyuan Du, H C Liu, Dongya Li, Yutai Man et autres
cn, jp
(code pays fourni par la source)
2026
article
OpenAlex
Chunxiao Yu, Y N Wu, Yibo Wang, Bochang Li et autres
cn
(code pays fourni par la source)