K. Sugino

Improvement of LWR/LER in ArFi lithography by optimization of resist formulation and laser E95

Toshihiro Kobayashi, Koichi Fujii, Takamitsu Komaki, T. Kumazaki et autres

The reduction of Line Width Roughness (LWR) and Line Edge Roughness (LER) is crucial for improving edge placement error (EPE) in ArF immersion lithography. This is especially important for patterns with a pitch of 80nm or less, where low image contrast exacerbates …

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Analyzing line width roughness (LWR) sensitivity to resist and laser-induced speckle for enhanced PSD-based quantification

Takamitsu Komaki, Tomohiro Iwaki, Yuichi Mukai, Kouichi Fujii et autres

As the proportion of LWR/CDU in the EPE budget has tightened in recent years, its reduction has become a critical issue. Among many factors, contributions of resist and speckle play a key role in LWR/CDU. The authors therefore carried out a series …

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0.1 μm level contact hole pattern formation with KrF lithography by resolution enhancement lithography assisted by chemical shrink (RELACS)

Toshiyuki Toyoshima, T. Ishibashi, A. Minanide, K. Sugino et autres

We developed a hole shrink process named RELACS (Resolution Enhancement Lithography Assisted by Chemical Shrink) that is a robust and low-cost method. This method makes use of crosslinking reaction between the materials coated on the resist pattern, and the acid existing at …

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Experimental investigation of the optimum specific input energy on a subsonic CO EDL

T. Arai, K. Sugino, M. Obara, Tomoo Fujioka

CW X-RAY PREIONIZED PULSED GAS LASERS

T. Arai, Yoshitaka Mori, Yuriko Imai, K. Sugino et autres

Abstract.- We have successfully demonstrated that the cw x-ray generator can work as a preionization source for a pulsed H F laser. The preionization effect of cw x radiation was revealed by a compara-tive study of with and without applying x-ray photons …

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