Medet Zhukush

Ultra-thin WS2 growth by ALD from bis(tert-butylimido)bis(dimethylamido)tungsten and 1,2-ethanedithiol and detailed surface mechanism

Zakaria Qoraiche, Medet Zhukush, Jules Galipaud, Laurent Veyre et autres

A molecular layer deposition/atomic layer deposition (MLD/ALD) strategy using bis(tert-butylimido)bis(dimethylamido)tungsten (BTBMW) and 1,2-ethanedithiol (EDT), the latter serving as a safer organic alternative to H2S, leads to the formation of ultrathin WS2 films via a molecular/hybrid tungsten organothiolate intermediate. A multiscale approach, involving …

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Reactions of Bis(tert‑butylimino)bis(dimethylamino) Tungsten(VI) with molecular silanol, silica and silicon wafer : Analogy Between Molecular and Surface Chemistries relevant to ALD thin film growths from BTBMW

Zakaria Qoraiche, Medet Zhukush, Jules Galipaud, Clément Camp et autres

We investigate the very first stages of tungsten film growth by atomic layer deposition (ALD) using the W(VI) precursor bis(t‑butylimino)bis(dimethylamino)tungsten BTBMW. Attention is given to the initial metal precursor pulse, probed on both model silica nanobeads support and SiO2-terminated silicon wafers. To …

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In situ study of the synthesis of lamellar metal chalcogenides by alternating deposition of organic & inorganic molecules

H. Renevier, Petros Abi Younes, E. V. Skopin, Medet Zhukush et autres

International audience

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Gas Sensing and Electrochemical Properties of CNT/WS 2 Core–shell Nanostructures

Rayhane Zribi, Simona Crispi, Daniele Giusi, Medet Zhukush et autres

Tungsten disulfide (WS 2 ) layers with different thicknesses were deposited on carbon nanotubes (CNTs) by atomic layer deposition (ALD) to obtain CNT/WS 2 core–shell heteronanostructures. WS 2 conformally grows like small platelet-flakes on the CNTs initially at low ALD cycles, while, …

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Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film

Petros Abi Younes, Ashok Kumar Yadav, Medet Zhukush, Van‐Hoan Le et autres

Amorphous organic-inorganic hybrid thin films (Ti-thiolate) deposited on thermal SiO2 substrate by atomic layer deposition/molecular layer deposition are converted into textured titanium disulfide (TiS2) ultrathin films, of thickness down to 5.5 nm, upon annealing under Ar/H2 (5%) atmosphere at mild temperature (300°C). …

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Transition Metal Dichalcogenide TiS 2 Prepared by Hybrid Atomic Layer Deposition/Molecular Layer Deposition: Atomic-Level Insights with In Situ Synchrotron X-ray Studies and Molecular Surface Chemistry

Petros Abi Younes, E. V. Skopin, Medet Zhukush, Laëtitia Rapenne et autres

In this work, a two-dimensional (2D) titanium disulfide (TiS 2 ) film was grown using tetrakis(dimethylamido)titanium and 1,2-ethanedithiol on a 100 nm thick amorphous SiO 2 /Si substrate. The first step of the process relied on the growth of an amorphous film …

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Surface organometallic chemistry for ALD growth of ultra-thin films of WS2 and their photo(electro)catalytic performances

Medet Zhukush

Chimie organométallique de surface pour la croissance ALD de films ultra-minces de WS2 et leurs performances photo(électro)catalytiques La croissance de couches ultra-minces de WS2 par un procédé innovant de dépôt par couche atomique ou ALD (pour Atomic ALyer Deposition) a été étudié …

Novel Photoactive Organometallic Catalysts for Solar Energy Harvest and Storage

Medet Zhukush

A Self-Limited Atomic Layer Deposition of WS2 Based on the Chemisorption and Reduction of Bis(t-butylimino)bis(dimethylamino) Complexes

Yanlin Wu, Muhammad Hamid Raza, Yen-Chun Chen, Patrick Amsalem et autres

A novel self-terminating chemical approach for the deposition of WS 2 by atomic layer deposition based on chemisorption of bis( t -butylimino)bis(dimethylamino)tungsten(VI) followed by sulfurization by H 2 S is reported. A broad spectrum of reaction parameters including temperatures of the reaction …

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Synthesis and characterization of metal (M = Al or Ga) 2-phosphino(phenolate/benzenethiolate) complexes and their electrochemical behavior in the presence of CO 2

Jessica A. Bruggen, Keyton D. Feller, Henry I. Schickel, Nazym Tuleushova et autres

A series of Group 13 complexes MLX 2 (M = Al or Ga, L = SC 6 H 4 -2-P t Bu 2 or OC 6 H 4 -2-P t Bu 2 , X = Me or C 6 F 5 ) …

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