Ultra-shallow EUV and soft X-ray gratings fabricated by broad-beam nitrogen ion irradiation

Résumé fourni par la source

Controlled and precise fabrication of structures with heights in the range of single digit nanometres is one of the challenges for diffraction gratings operating near-normal incidence in the extreme ultraviolet (EUV) and soft X-ray range. Here, we expand on previous research utilizing swelling of silicon after irradiation with ions as alternative to conventional dry etching. By irradiating silicon through a mask with a broad beam of nitrogen ions, we realized lamellar gratings in a precise and well controlled process. We were able to fabricate gratings with structure heights between (1.00 +/- 0.05) nm to (10.0 +/- 0.5) nm and a pitch of 1 micrometre, which is suitable for both EUV and soft X-ray applications. A variation of ion energy from 20 keV to 40 keV further expands the foundations of this process and yielded an additional parameter to control the resulting structure height and shape.

Ce résumé expose les affirmations des auteurs. BNTIC ne l’interprète pas comme une validation indépendante des résultats.