In situ formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN
Rattachement africain : nl, us, cl. Niveau de preuve : code pays fourni par la source.
Le résumé fourni par la source
Small molecule inhibitors (SMIs) have been gaining attention in the field of area-selective atomic layer deposition (ALD) because they can be applied in the vapor-phase. A major challenge for SMIs is that vapor-phase application leads to a disordered inhibitor layer with lower coverage as compared to self-assembled monolayers, SAMs. A lower coverage of SMIs makes achieving high selectivity for area-selective ALD more challenging. To overcome this challenge, mechanistic understanding is required for the formation of SMI layers and the resulting precursor blocking. In this study, reflection adsorption infrared spectroscopy measurements are used to investigate the performance of aniline as an SMI. Our results show that aniline undergoes catalytic surface reactions, such as hydrogenolysis, on a Ru non-growth area at substrate temperatures above 250 °C. At these temperatures, a greatly improved selectivity is observed for area-selective TaN ALD using aniline as an inhibitor. The results suggest that catalytic surface reactions of the SMI play an important role in improving precursor blocking, likely through the formation of a more carbon-rich inhibitor layer. More prominently, catalytic surface reactions can provide a new strategy for forming inhibitor layers that are otherwise very challenging or impossible to form directly through vapor-phase application.
Ce résumé expose les affirmations des auteurs. BNTIC ne l’interprète pas comme une validation indépendante des résultats.
Le contrôle bibliographique ouvert
DOI retrouvé dans Crossref DOI retrouvé, mais le titre doit être comparé manuellement.
- Titre Crossref
- <i>In situ</i> formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN
- Date Crossref
- 22/05/2024
- Éditeur
- AIP Publishing
- Type
- journal-article
Ce recoupement confirme des métadonnées liées au DOI. Il ne confirme ni la méthode ni les conclusions de l’étude, et il ne compte pas comme une seconde source scientifique indépendante.
Où se fait cette recherche
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Eindhoven University of Technology Department of Applied Physics pays non établi dans la noticeUniversité ou école supérieure
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Intel (United States) pays non établi dans la noticeEntreprise
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Federico Santa María Technical University pays non établi dans la noticeUniversité ou école supérieure
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Intel Corporation 2 pays non établi dans la noticeInstitution
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Department of Chemical and Environmental Engineering pays non établi dans la noticeInstitution
Department of Applied Physics — Eindhoven University of Technology, Intel (United States) et Federico Santa María Technical University, avec 2 autres affiliations.
Une affiliation ne permet pas de déduire la nationalité d’un auteur.