Local work function deviations at step edges of Si (111)
Minghao Wu, Shuxuan Zhang, Congrun Chen, Chen Luo et autres
Abstract Kelvin Probe Force Microscopy (KPFM) is a crucial technique for characterizing nanoscale variations in local work functions, particularly at surface defects that significantly influence surface electronic properties. Although it is well established that surface defects perturb local work functions, their quantitative …
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