Tert‐Butyl–Engineered Trinuclear Tin Complexes for High‐Sensitivity Sub‐10 Nm Patterning
Xiaofeng Gong, Riyao Cong, Xinyan Huang, Yingdong Zhao et autres
ABSTRACT As nano‐devices approach sub‐10 nm resolution, photoresists face increasing demands for both superior pattern fidelity and high sensitivity. However, achieving an optimal balance between high resolution and sensitivity remains a major challenge for existing photoresist systems. In this study, we report …
cn (code pays fourni par la source)
4 citations
Advanced Functional Materials