Profil bibliographique

Jong Hyeon Shin

Informations fournies par OpenAlex. Research Africa ne déduit ni nationalité, ni poste, ni coordonnées personnelles.

2Publications signalées
7Citations signalées
1Affiliations récentes

Les institutions déclarées

Korea Institute of Fusion Energy

Les domaines associés

Plasma Applications and DiagnosticsPlasma Diagnostics and ApplicationsAdvancements in Photolithography TechniquesCopper Interconnects and ReliabilityIndustrial Vision Systems and Defect Detection

Les publications récentes

2026 article OpenAlex

Bias frequency effects on the high-aspect-ratio trench etching of hard mask and dielectric layers in Ar/O 2 /C 4 F 6 /C 4 F 8 dual-frequency capacitively coupled plasma

Jong‐Bae Park, Jong Hyeon Shin, S S Kim, Hee-Jung Yeom et autres

Abstract The effect of bias frequency on plasma characteristics and etching performance was investigated in a dual-frequency capacitively coupled plasma system, with 100 MHz source power fixed at the upper electrode and bias frequency varied at the lower electrode between 2 and …

kr (code pays fourni par la source)

0 citations Japanese Journal of Applied Physics
Accès ouvert 2024 article OpenAlex

Improved Plasma Etch Endpoint Detection Using Attention-Based Long Short-Term Memory Machine Learning

Ye Jin Kim, Jung Ho Song, Kynghyun Cho, Jong Hyeon Shin et autres

Existing etch endpoint detection (EPD) methods, primarily based on single wavelengths, have limitations, such as low signal-to-noise ratios and the inability to consider the long-term dependencies of time series data. To address these issues, this study proposes a context of time series …

kr (code pays fourni par la source)

7 citations Electronics
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