Aller au contenu principal
Profil bibliographique

K. Park

Informations fournies par OpenAlex. Research Africa ne déduit ni nationalité, ni poste, ni coordonnées personnelles.

27Publications signalées
461Citations signalées
1Affiliations récentes

Les institutions déclarées

Les domaines associés

Lung Cancer Treatments and MutationsSemiconductor materials and devicesGastric Cancer Management and OutcomesAdvancements in Semiconductor Devices and Circuit DesignColorectal Cancer Treatments and Studies

Les publications récentes

2025 conference-paper OpenAlex

High Performance and Reliable 4F2 IGZO Vertical Channel Transistor (VCT) with Extremely Low Contact Resistance and 10 year BTI lifetime for sub-10nm DRAM

Daewon Ha, Yunsung Lee, Kyoung-Jun Moon, Sangmoon Lee et autres

For the first time, we present experimental demonstration of a high-performance and highly reliable IGZO vertical channel transistor (VCT). It exhibits excellent leakage current$(< 0.1 \text{aA}/\mu \mathrm{m})$and switching characteristics$(98\ \text{mV}/\text{dec})$with VTof -0.13V at$85^{\circ}\mathrm{C}$. Furthermore, it provides a symmetric IONof 49.5$\mu \mathrm{A}/\mu \mathrm{m}$at …

kr (code pays fourni par la source)

11 citations
2025 conference-paper OpenAlex

Novel Three-Dimensional DRAM Cell Architectures with IGZO-Channel and Key Technologies Toward Sub-10nm and Beyond

Wonsok Lee, Daewon Ha, Yunsung Lee, Seung‐Hwan Yoo et autres

As DRAM device dimension approaches 10nm scale and below in buried cell array transistors (BCAT), it is indispensable to adopt innovative cell structures and/or new materials for the next generation DRAM architecture. In this paper, three promising candidates of IGZO-based DRAM cell …

kr (code pays fourni par la source)

3 citations
Accès ouvert 2024 conference-paper OpenAlex

IGZO Channel VCT(Vertical Channel Transistor) Technology for sub-10nm DRAM: Challenges and Opportunites

Yongjin Lee, Daewon Ha, W. Lee, Seung‐Hwan Yoo et autres

In DRAM technology at nodes below 10 nm, scaling down conventional architectures presents significant challenges due to uprising physical limit on integration and electrical properties. As alternatives, innovative structures incorporating deposition channels, such as VCT with IGZO channels, are being explored. This …

kr (code pays fourni par la source)

4 citations
2024 conference-paper OpenAlex

Exploring Innovative IGZO-channel based DRAM Cell Architectures and Key Technologies for Sub-10nm Node

Daewon Ha, Yunsung Lee, Seung‐Hwan Yoo, W. Lee et autres

In order to sustain DRAM scaling trajectory below 10nm node, it is indispensable to adopt innovative cell structures, advanced processes and novel materials such as IGZO. In this paper, we will discuss promising candidates for IGZO-based DRAM cell architecture including vertical channel …

kr (code pays fourni par la source)

31 citations

BNTIC News n’est pas le producteur de ces données. Les publications sont interrogées à la demande dans Crossref, OpenAIRE, DOAJ, Europe PMC, HAL, DataCite, AfricArXiv, ROR et la Banque mondiale, sans clé d’accès. OpenAlex reste optionnel. Aucun service payant n’est nécessaire et aucune donnée externe n’est enregistrée en base. Consulter les sources et leurs limites.