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Profil bibliographique

François Senocq

Informations fournies par OpenAlex. Research Africa ne déduit ni nationalité, ni poste, ni coordonnées personnelles.

113Publications signalées
3550Citations signalées
5Affiliations récentes

Les institutions déclarées

Les domaines associés

Semiconductor materials and devicesCopper Interconnects and ReliabilityMetal and Thin Film MechanicsCrystallization and Solubility StudiesX-ray Diffraction in Crystallography

Les publications récentes

Accès ouvert 2023 article OpenAlex

Silicon Oxynitride Coatings Are Very Promising for Inert and Durable Pharmaceutical Glass Vials

Konstantina Christina Topka, Babacar Diallo, Maxime Puyo, Erwan Chesneau et autres

High Resolution Image Download MS PowerPoint Slide Glass packaging of novel medicinal molecules is challenged by hydrolysis of the glass network from an interaction with the stored drug, likely to result in leaching of constituent elements of the glass into the solution. …

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5 citations ACS Applied Engineering Materials
Accès ouvert 2022 article OpenAlex

Critical Level of Nitrogen Incorporation in Silicon Oxynitride Films: Transition of Structure and Properties, toward Enhanced Anticorrosion Performance

Konstantina Christina Topka, Babacar Diallo, Maxime Puyo, Paris Papavasileiou et autres

Silicon oxynitride (SiO x N y ) thin films are widely encountered in today’s major key enabling technologies. Exhibiting tunable properties dependent on the nitrogen content, they attract attention in applications requiring thermal stability, high dielectric constant, corrosion resistance, surface passivation, and …

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13 citations ACS Applied Electronic Materials
Accès ouvert 2021 article OpenAlex

Network hydration, ordering and composition interplay of chemical vapor deposited amorphous silica films from tetraethyl orthosilicate

Babacar Diallo, Konstantina Christina Topka, Maxime Puyo, Charlotte Lebesgue et autres

The chemical or mechanical performance of amorphous SiO2 films depend on intrinsic physicochemical properties, which are intimately linked to atomic and molecular arrangements in the Si–O–Si network. In this context, the present work focuses on a comprehensive description of SiO2 films deposited …

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11 citations Journal of Materials Research and Technology
Accès ouvert 2021 article OpenAlex

An innovative GC-MS, NMR and ESR combined, gas-phase investigation during chemical vapor deposition of silicon oxynitrides films from tris(dimethylsilyl)amine

Laura Decosterd, Konstantina Christina Topka, Babacar Diallo, Diane Samélor et autres

Tris(dimethylsilyl)amine (TDMSA) is used in the presence of O2 and NH3 for the atmospheric pressure chemical vapor deposition (CVD) of conformal, corrosion barrier silicon oxynitride (SiOxNy) films at moderate temperature. Plausible decomposition pathways taking place during the process, as well as resulting …

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6 citations Physical Chemistry Chemical Physics

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