Accès ouvert
2026
article
OpenAlex
Xiaotong Ma, Wei Li
Matrix differential equations with time delay are crucial to the modeling of complex multivariate systems. However, the existing semi-analytic Laplace residual power series method (LRPSM) literature mainly focuses on scalar or no-delay problems, and lacks rigorous theoretical guarantees for matrix-valued time delay …
cn, gb
(code pays fourni par la source)
2026
article
OpenAlex
Zhi Gao, Dongpo Wang, Shuaixing Yan, Wei Li et autres
cn
(code pays fourni par la source)
2026
article
OpenAlex
Wei Li, Yang Ran, Hao Pu, Paul Schonfeld et autres
cn, us
(code pays fourni par la source)
2026
article
OpenAlex
Junyi Chen, R A N Xu, Chengfeng Ma, Wei Li et autres
ABSTRACT Plant growth in nature is highly dependent on sunlight. Plants grown under low‐light conditions often exhibit leaf yellowing. This phenomenon occurs because Fe 3+ is reduced to Fe 2+ under ultraviolet light, and a deficiency of Fe 2+ impairs the ability …
cn
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Accès ouvert
2026
article
OpenAlex
Wenhui Deng, Gaoshuang He, Haozhi Zhou, Wenhao He et autres
Abstract Bismuth vanadate (BiVO 4 ) is regarded as a promising photoanode for photoelectrochemical (PEC) water splitting. Despite its advantage in band gap and visible-light response, the BiVO 4 exhibits an unsatisfactory achieving water splitting due to severe charge recombination. Herein, we …
cn
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Accès ouvert
2026
conference-paper
OpenAlex
Sanaz Bakhshi Nia, Ruilin Zhu, Wei Li
The global automotive industry is undergoing a profound and rapid digital transformation, driven by electrification (EVs), autonomous driving, and connected services. This represents a foundational shift away from traditional manufacturing and toward a model focused on Intelligent, Broadband, and Integrated Services (IBIS), …
fr, gb, cn
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2026
article
OpenAlex
Zhongguan Liu, Shuaidong Yuan, Wei Li, Pan Lu
cn
(code pays fourni par la source)
Accès ouvert
2025
article
OpenAlex
Devin Sima, Wei Li, Chuanmin Hu, Shengrui Zhang
For advanced semiconductor nodes, the demand for high-precision patterning of complex foundry circuits drives the widespread use of Lithography-Etch-Lithography-Etch (LELE)-a key Multiple Patterning Technology (MPT)-in Deep Ultraviolet (DUV) processes. However, the interaction between LELE's two Lithography-Etch (LE) cycles makes it very challenging …
cn
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2025
conference-paper
OpenAlex
Devin Sima, Wei Li, Tzung-Hua Ying, Shengrui Zhang et autres
Double patterning technology plays an increasingly important role in the DUV process, especially the reduction of nodes makes it indispensable. Among various kinds of double patterning techniques, lithography-etch-lithography-etch (LELE) double patterning is chosen for printing complex foundry circuit designs. For this reason, …
cn
(code pays fourni par la source)
2025
conference-abstract
OpenAlex
Wei Li, Tzung-Hua Ying, Devin Sima, Tatsi Iao et autres
The control of critical dimension uniformity (CDU) plays a key role in memory and logic semiconductor with the CD shrinking smaller and smaller. And the CD bias may be induced from different pattern density. Furthermore, the CD bias will result in worse …
cn
(code pays fourni par la source)
2025
conference-paper
OpenAlex
Xi Liu, Yuan Hua, Wang Qing-ping, Wei Li et autres
To address the complex failure mechanisms and prediction inaccuracies associated with aero-engine curvic coupling structures, this study develops a multiaxial damage-coupled model that integrates critical plane energy parameters with friction work threshold regulation. A life prediction equation is formulated by incorporating a …
cn
(code pays fourni par la source)
2025
article
OpenAlex
Hamzah A. A. M. Qaid, Bo Zhang, S. S. Su, Dan Li et autres
cn, sg
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