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Profil bibliographique

Wei Li

Informations fournies par OpenAlex. Research Africa ne déduit ni nationalité, ni poste, ni coordonnées personnelles.

482Publications signalées
5466Citations signalées
7Affiliations récentes

Les institutions déclarées

Les domaines associés

Machine Fault Diagnosis TechniquesFault Detection and Control SystemsGear and Bearing Dynamics AnalysisAdvanced Sensor and Control SystemsIndustrial Technology and Control Systems

Les publications récentes

Accès ouvert 2026 article OpenAlex

Convergence Analysis and Error Propagation of the Laplace Residual Power Series Method for Linear Delay Matrix Differential Equations

Xiaotong Ma, Wei Li

Matrix differential equations with time delay are crucial to the modeling of complex multivariate systems. However, the existing semi-analytic Laplace residual power series method (LRPSM) literature mainly focuses on scalar or no-delay problems, and lacks rigorous theoretical guarantees for matrix-valued time delay …

cn, gb (code pays fourni par la source)

0 citations Mathematics
2026 article OpenAlex

Revisiting Iron's Role in Nature to Fabricate Functional Elastomer With Tunable Mechanical Properties and Promising Optical Applications

Junyi Chen, R A N Xu, Chengfeng Ma, Wei Li et autres

ABSTRACT Plant growth in nature is highly dependent on sunlight. Plants grown under low‐light conditions often exhibit leaf yellowing. This phenomenon occurs because Fe 3+ is reduced to Fe 2+ under ultraviolet light, and a deficiency of Fe 2+ impairs the ability …

cn (code pays fourni par la source)

0 citations Advanced Functional Materials
Accès ouvert 2026 article OpenAlex

Single-Atom Ru in CoFe-LDH Drives Efficient Charge Separation on BiVO4 for Solar Water Splitting

Wenhui Deng, Gaoshuang He, Haozhi Zhou, Wenhao He et autres

Abstract Bismuth vanadate (BiVO 4 ) is regarded as a promising photoanode for photoelectrochemical (PEC) water splitting. Despite its advantage in band gap and visible-light response, the BiVO 4 exhibits an unsatisfactory achieving water splitting due to severe charge recombination. Herein, we …

cn (code pays fourni par la source)

7 citations Nano-Micro Letters
Accès ouvert 2026 conference-paper OpenAlex

Navigating Digital Transformation: The Strategic Alliance as a Digital Catalyst for Corporate Digital Entrepreneurship in China’s EV Transition

Sanaz Bakhshi Nia, Ruilin Zhu, Wei Li

The global automotive industry is undergoing a profound and rapid digital transformation, driven by electrification (EVs), autonomous driving, and connected services. This represents a foundational shift away from traditional manufacturing and toward a model focused on Intelligent, Broadband, and Integrated Services (IBIS), …

fr, gb, cn (code pays fourni par la source)

0 citations AHFE international
Accès ouvert 2025 article OpenAlex

AI-Assisted Composite Etch Model for MPT

Devin Sima, Wei Li, Chuanmin Hu, Shengrui Zhang

For advanced semiconductor nodes, the demand for high-precision patterning of complex foundry circuits drives the widespread use of Lithography-Etch-Lithography-Etch (LELE)-a key Multiple Patterning Technology (MPT)-in Deep Ultraviolet (DUV) processes. However, the interaction between LELE's two Lithography-Etch (LE) cycles makes it very challenging …

cn (code pays fourni par la source)

0 citations Micromachines
2025 conference-paper OpenAlex

A composite model for LELE process

Devin Sima, Wei Li, Tzung-Hua Ying, Shengrui Zhang et autres

Double patterning technology plays an increasingly important role in the DUV process, especially the reduction of nodes makes it indispensable. Among various kinds of double patterning techniques, lithography-etch-lithography-etch (LELE) double patterning is chosen for printing complex foundry circuit designs. For this reason, …

cn (code pays fourni par la source)

1 citation
2025 conference-abstract OpenAlex

A comprehensive intra-CD uniformity control through optimizing pattern loading effect correction by AI-trained model

Wei Li, Tzung-Hua Ying, Devin Sima, Tatsi Iao et autres

The control of critical dimension uniformity (CDU) plays a key role in memory and logic semiconductor with the CD shrinking smaller and smaller. And the CD bias may be induced from different pattern density. Furthermore, the CD bias will result in worse …

cn (code pays fourni par la source)

0 citations
2025 conference-paper OpenAlex

Fretting fatigue life model and validation of curvic coupling structures based on friction work threshold regulation

Xi Liu, Yuan Hua, Wang Qing-ping, Wei Li et autres

To address the complex failure mechanisms and prediction inaccuracies associated with aero-engine curvic coupling structures, this study develops a multiaxial damage-coupled model that integrates critical plane energy parameters with friction work threshold regulation. A life prediction equation is formulated by incorporating a …

cn (code pays fourni par la source)

0 citations IET conference proceedings.

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