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Profil bibliographique

H. Wang

Informations fournies par OpenAlex. Research Africa ne déduit ni nationalité, ni poste, ni coordonnées personnelles.

12Publications signalées
125Citations signalées
2Affiliations récentes

Les institutions déclarées

Les domaines associés

Semiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignHydrocarbon exploration and reservoir analysisEnhanced Oil Recovery TechniquesCO2 Sequestration and Geologic Interactions

Les publications récentes

2025 article OpenAlex

Failure Analysis–Informed Risk Assessment Framework for Geological Carbon Storage Using Numerical Simulation and Machine Learning

H. Wang, Hailun Ni, Tao Bai, Ting Xiao et autres

Summary Geological carbon storage (GCS) is recognized as a critical technology for achieving large-scale reductions in anthropogenic carbon dioxide (CO2) emissions. Ensuring long-term containment and safety requires robust risk assessment frameworks that account for geological uncertainty and identify potential failure scenarios. Among …

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2 citations SPE Journal
2025 article OpenAlex

Using a Well-Controlled Heterogeneous Permeability Field to Study Its Role on Miscible Density-Driven Convection in Porous Media and the Implications to Geological Carbon Sequestration

Ruichang Guo, Hanxing Sun, H. Wang, Zihao Li et autres

Summary In this work, we report on a new experimental method to construct well-controlled heterogeneous permeability fields to study miscible density-driven convection in quasi-2D porous media, which has implications for geological carbon sequestration (GCS) in saline aquifers. Dissolution trapping is a critical …

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3 citations SPE Journal
2024 article OpenAlex

Comparative Assessment of U-Net-Based Deep Learning Models for Segmenting Microfractures and Pore Spaces in Digital Rocks

H. Wang, Ruichang Guo, Laura E. Dalton, Dustin Crandall et autres

Summary Segmentation of high-resolution X-ray microcomputed tomography (µCT) images is crucial in digital rock physics (DRP), affecting the characterization and analysis of microscale phenomena in the porous media. The complexity of geological structures and nonideal scanning conditions pose significant challenges to conventional …

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21 citations SPE Journal
2003 conference-paper OpenAlex

Source-side barrier effects with very high-K dielectrics in 50 nm Si MOSFETs

D.L. Kencke, W. Chen, H. Wang, S. Mudanai et autres

High permittivity (K) gate insulators are projected for sub-100 nm Si MOSFETs since direct tunneling will likely limit SiO/sub 2/ thicknesses to 1.0-1.5 nm. High-K insulators avoid tunneling, but their larger physical thicknesses introduce subtle capacitive coupling phenomena such as fringing-induced barrier …

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16 citations
2002 conference-paper OpenAlex

The origin of secondary electron gate current: a multiple-stage Monte Carlo study for scaled, low-power flash memory

D.L. Kencke, X. Wang, H. Wang, Q. Ouyang et autres

A multiple-stage simulation procedure identifies, for the first time, the location of secondary electrons that very efficiently produce gate currents in flash EEPROMs. The simulation method incorporates both electron and hole Monte Carlo analysis to calculate this secondary electron gate current without …

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10 citations
2002 conference-paper OpenAlex

Temperature characterization and modeling of electron and hole mobilities in MOS accumulation layers

S. Mudanai, G. Chindalore, W.-K. Shih, H. Wang et autres

The need to understand and predict MOS accumulation layer mobility has become increasingly important as MOS devices scale to the 100 nm gate length range. Indeed, the accumulation layer in the shallow source/drain extension in MOSFETs is becoming a significant part of …

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0 citations
1998 article OpenAlex

Computationally efficient models for quantization effects in MOS electron and hole accumulation layers

S.A. Hareland, M. Manassian, W.-K. Shih, S. Jallepalli et autres

In this paper, models appropriate for device simulators are developed which account for the quantum mechanical nature of accumulated regions. Accumulation layer quantization is important in deep submicron (/spl les/0.25 /spl mu/m) MOS devices in the overlapped source/drain extension regions, in accumulation …

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32 citations IEEE Transactions on Electron Devices

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