J. Beckers

Charging behavior of single and clustered microparticles in spatiotemporal afterglow plasmas

Rik Peelen, P. Blom, J. Beckers

The charging dynamics of microparticles in plasma afterglows are critical in various scientific and technological contexts, including astrophysics, semiconductor processing, and fusion devices. While single-particle charging in steady-state plasmas is well understood, the transient behavior of aggregates in the spatiotemporal afterglow remains …

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Particle (de-)charging in low pressure afterglow plasma for contamination control: a comparative study between conducting and non-conducting particles

J. Beckers, Rik Peelen, Jakub Grecner, P. Blom

In modern semiconductor processing, maintaining ultralow levels of contamination by (sub)micrometer-sized particles is crucial. Such contaminants may be introduced into these environments from the outside through translational and/or rotational (robotic) feedthroughs. A promising way forward to mitigate particle contamination is by developing …

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High erosion and re-deposition rates of tungsten in the highly collisional plasmas of Magnum-PSI

Mark Johannes Hendrikus Cornelissen, B. Tyburska-Püschel, M. Rasiński, S. Brons et autres

Abstract Prompt re-deposition strongly reduces the migration of eroded material in current fusion devices, thus lowering core dilution and extending the lifetime of the plasma-facing components. However, under the high-density ( n e > 2 × 10 20 m−3), low-temperature ( T …

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Erosion enhancement by impurity entrainment in the highly collisional plasmas of Magnum-PSI

Mark Johannes Hendrikus Cornelissen, J.W.M. Vernimmen, Jesse Verstappen, E. Zoethout et autres

Abstract Extrinsic impurity seeding is planned for ITER to avoid high heat fluxes to the tungsten divertor targets. Nevertheless, excessive sputtering by impurities would lead to a reduction in fusion power output and divertor lifetime. Unlike today’s fusion devices, the entrainment of …

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(Invited) Photon-Induced Plasmas and Contamination Control in Semiconductor Industry

J. Beckers

One of the crucial steps in the fabrication process of computer chips is photolithography. This process uses Extreme Ultraviolet (EUV) photons with a wavelength as short as 13.5 nm, which are transported from their source, via a multitude of multilayer mirrors and …

Particle mobilization by EUV-induced plasma and fast electrons

Mark van de Kerkhof, Dmitry Shefer, Andrey Nikipelov, Fabio Sbrizzai et autres

With state-of-the-art EUV lithography moving to the 3 and 2 nm nodes, yield control and connected to that particle contamination control are crucial aspect of High-Volume Manufacturing (HVM). While much progress has been made in recent years, the continuously tightening node requirements …

The influence of an externally applied electric field on residual microparticle charge in a spatio-temporal afterglow plasma

J. C. A. van Huijstee, P. Blom, J. Beckers

The residual charge of dust particles in spatial and temporal afterglow plasmas is relevant in many fundamental research fields and technological applications. It has been shown in both spatial and temporal afterglow plasmas that the presence of an externally applied electric field …

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Real-time in situ monitoring of dust particle growth in a low-pressure nanodusty plasma based on laser-induced photodetachment

T. J. M. Donders, J. Beckers

Particulate matter air pollution in the form of ultrafine dust is a growing global concern. In this Letter, we will use a nanodusty Ar/HMDSO plasma as a model system for a heavily contaminated gas and we present the development of a technique …

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Physics and applications of dusty plasmas: The Perspectives 2023

J. Beckers, Johannes Berndt, Dietmar Block, M. Bönitz et autres

Dusty plasmas are electrically quasi-neutral media that, along with electrons, ions, neutral gas, radiation, and electric and/or magnetic fields, also contain solid or liquid particles with sizes ranging from a few nanometers to a few micrometers. These media can be found in …

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A novel diagnostic for dust particle size in a low-pressure nanodusty plasma based on the decay of the electron density released by laser-induced photodetachment

T. J. M. Donders, T. J. A. Staps, J. Beckers

One of the key parameters in low-pressure nanodusty plasmas is the dust particle size. In this work, we introduce a new method for the determination of the dust particle size in a nanodusty plasma, created in a mixture of argon and hexamethyldisiloxane. …

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Laser light scattering (LLS) to observe plasma impact on the adhesion of micrometer-sized particles to a surface

Dmitry Shefer, Andrey Nikipelov, Mark van de Kerkhof, Vadim Banine et autres

Abstract Laser light scattering (LLS) method, combined with a long-distance microscope was utilized to detect micrometer-sized particles on a smooth substrate. LLS was capable to detect individual particle release, shrink, or fragmentation during exposure to a plasma or a gas jet. In-situ …

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Laser light scattering (LLS) to observe plasma impact on the adhesion of micrometer-sized particles to a surface

Dmitry Shefer, Andrey Nikipelov, Marleen van de Kerkhof, Vadim Banine et autres

Laser Light Scattering (LLS) method, combined with a long-distance microscope was utilized to detect micrometer-sized particles on a smooth substrate. LLS was capable to detect individual particle release, shrink, or fragmentation during exposure to a plasma or a gas jet. In-situ monitoring …