Nizan Kenane

Evaluating three dimensionally engineered dry resist film performance for 0.33NA and High-NA EUV patterning

Saumya Gulati, Chun-Chia Brown Lu, Phil Friddle, Nizan Kenane et autres

Lam’s Aether dry resist, first introduced in 2020, offers significantly higher EUV sensitivity and lower defectivity than conventional resists—capabilities that are critical for achieving high yields at advanced technology nodes. Its precise vapor-phase deposition enables recipe-level control of film thickness, uniformity, and …

Enabling 0.55NA EUV logic patterning with 3-D engineered dry resist films

Shruti Jambaldinni, Zhengtao Chen, Shubhankar Das, Nizan Kenane et autres

Dry resist process development toward depth of focus improvement in high NA EUV lithography

Ching-Chung Huang, Ali Haider, Zhengtao Chen, Francesco Gullo et autres

High numerical aperture (NA) extreme ultraviolet lithography enables device scaling and improves resolution. However, it also brings the challenge of reduced depth of focus (DOF) due to the optics with increased NA. New resist innovations are being targeted toward addressing this patterning …

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Holistic dry resist optimization on bright field EUV contact hole patterning

Ching-Chung Huang, Francesco Gullo, Mohand Brouri, Anuja De Silva et autres

Dry deposited and dry developed resists have demonstrated excellent patterning performance on pushing resolution with improved stochastic defectivity. In this work, dry resist patternability was explored via a center-to-center (C2C) 32nm bright field hexagonal contact hole (CH) test vehicle with 0.33NA EUV …

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Dry Deposition and Dry Development of Metal Oxide Based Photoresist

Nizan Kenane, Anuja De Silva, Haider Ali, Linh Cao Hoang et autres

Herein, we present high-resolution EUV patterning results achieved using Lam Research’s negative-tone metal-oxide-based photoresist. We enable an entirely dry resist process flow by employing both the deposition and the development in the vapor phase. This approach offers benefits over conventional spin coating …

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High-Resolution Lithographic Patterning with Organotin Films: Role of CO2 in Differential Dissolution Rates

Nizan Kenane, Douglas A. Keszler

Details of the chemistry enabling the patterning of organotin photoresists to single-digit-nm resolution continue to engage study. In this report, we examine the contributions of atmospheric gases to the differential dissolution rates of an n -butyltin oxide hydroxide photoresist. Cryo scanning tunneling …

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CCDC 1992435: Experimental Crystal Structure Determination

Nizan Kenane, Markas A. Grove, Cory K. Perkins, Tristan R. Reynolds et autres

An entry from the Cambridge Structural Database, the world’s repository for small molecule crystal structures. The entry contains experimental data from a crystal diffraction study. The deposited dataset for this entry is freely available from the CCDC and typically includes 3D coordinates, …

Hydrolysis and Condensation of n-BuSnCl3: Enabling Deposition of Smooth Metal Oxide Photoresist Thin Films

Nizan Kenane, Markas A. Grove, Cory K. Perkins, Tristan R. Reynolds et autres

Herein, we report hydrolysis and condensation chemistries of C 4 H 9 SnCl 3 to molecular clusters and gel films. Precursor speciation plays a key role in film formation and quality toward realization of atomically smooth surfaces. Density functional theory investigations of …

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Demonstration of Fowler–Nordheim Tunneling in Simple Solution-Processed Thin Films

Cory K. Perkins, Melanie A. Jenkins, Tsung-Han Chiang, Ryan H. Mansergh et autres

The production of high-quality thin-film insulators is essential to develop advanced technologies based on electron tunneling. Current insulator deposition methods, however, suffer from a variety of limitations, including constrained substrate sizes, limited materials options, and complexity of patterning. Here, we report the …

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Alkyltin Keggin Clusters Templated by Sodium

Sumit Saha, Deok‐Hie Park, Danielle C. Hutchison, Morgan R. Olsen et autres

Abstract Dodecameric (Sn12) and hexameric topologies dominate monoalkyltin–oxo cluster chemistry. Their condensation, triggered by radiation exposure, recently produced unprecedented patterning performance in EUV lithography. A new cluster topology was crystallized from industrialn‐BuSnOOH, and additional characterization techniques indicate other clusters are present. Single‐crystal …

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Alkyltin Keggin Clusters Templated by Sodium

Sumit Saha, Deok‐Hie Park, Danielle C. Hutchison, Morgan R. Olsen et autres

Abstract Dodecameric (Sn12) and hexameric topologies dominate monoalkyltin–oxo cluster chemistry. Their condensation, triggered by radiation exposure, recently produced unprecedented patterning performance in EUV lithography. A new cluster topology was crystallized from industrial n‐BuSnOOH, and additional characterization techniques indicate other clusters are present. …

us, fr (code pays fourni par la source)