Upgrades to DTU475 coating chamber: periodic 1nm SiC/W multilayers, 3D-graded coatings, and deposition of 550mm long mirrors

Le résumé fourni par la source

We present upgrades and expanded capabilities of the DTU475 DC magnetron sputtering chamber at the Technical University of Denmark. The system, previously used for the production of NuSTAR multilayer optics, has been refurbished to improve deposition throughput, process stability, and coating uniformity. The upgraded chamber enables uniform coating of substrates up to 550 mm in length, extending its applicability to large X-ray optical elements for synchrotron beamlines and calibration facilities. We demonstrate the deposition of periodic SiC/W multilayers with d-spacings down to 1 nm and interface roughness of 0.3 nm. In addition, we show the capability to produce three-dimensionally graded coatings with controlled thickness gradients along the axial, lateral, and depth directions of the mirror. These results establish DTU475 as a versatile platform for advanced X-ray optics development.

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