Etch-free fabrication of strip-loaded thin-film lithium niobate integrated photonic components

Le résumé fourni par la source

Lithium niobate (LN) offers a unique combination of nonlinear, electro-optic, and optical properties, but conventional etching-based fabrication of optical ridge waveguide-based photonic integrated circuits requires expensive facilities and comes with long development cycles. Here, we present an alternative, etch-free approach using multiphoton lithography to create polymer strip-loaded waveguides on thin-film LN. This method enables rapid prototyping and low-cost fabrication using production technologies with less complexity and higher flexibility. We demonstrate key photonic components such as waveguide bends and directional couplers on thin-film LN with a thickness of 600 nm. The results establish a versatile framework for LN-based photonic integrated circuits and pave the way for scalable, low-cost, high-performance photonic chip manufacturing.

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