Surface Engineering of Ti–Pt Bottom Electrodes for Precise Texture Control of PZT Thin Films on Si

Le résumé fourni par la source

Growing ferroelectric films with different textures under identical process conditions poses a significant materials challenge. The texture of the ferroelectric films is largely influenced by the underlying substrate. Ti/Pt deposited on silicon is widely used as a bottom electrode and substrate for the growth of PZT thin films. In this study, we developed a novel two-step deposition process to engineer the surface of the Ti/Pt bottom electrode, enabling the growth of distinct (100) and (111) textured PZT thin films on different regions of the same silicon wafer. Using photolithography, we successfully sputter-deposited monolayer and bilayer Ti/Pt on separate regions of the wafer, allowing for controlled texture formation under identical processing conditions. We found that the bilayer Ti/Pt bottom electrode effectively suppressed Ti diffusion and oxide formation, critical factors for achieving (100) textured PZT growth. In contrast, the monolayer Ti/Pt exhibited Ti diffusion and oxide formation, leading to the growth of (111) textured PZT. Ferroelectric and piezoelectric measurements showed that (100) textured films exhibited enhanced piezoelectric and dielectric properties, ( d 33,f(100) = 115 pm/V, d 33,f(111) = 36 pm/V). These findings highlight the potential of surface-engineered Ti/Pt electrodes in optimizing PZT thin films for piezoelectric MEMS applications.

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