The effect of xenon content on homogeneous Ne/Xe/HCl plasma properties

Le résumé fourni par la source

In this paper, we examine numerically the effect of xenon percentage in the Ne/Xe/HCl gas mixture on the discharge plasma properties at high pressure. A homogeneous plasma under the close conditions of excimer laser functioning is considered. For this, a zero-dimensional modeling is performed and it is found, under the considered conditions, that increasing Xe concentration in the gas mixture affects the discharge current and electron density. Also, the electron deposited power and excimer laser gain are more important when the xenon content in the gas mixture has been increased.

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