VₜTuning of Split-Gate GeSi Nanosheet CFETs With Dual Work Function Metals

Résumé fourni par la source

A novel device integration scheme for dual-work-function-metal split-gate complementary FETs (CFETs) is demonstrated. Multiple p/n junctions are used to electrically isolate the vertically stacked transistors. The effective work function (EWF) of WNxCyis modulated by the N2/H2flow ratio during the plasma-enhanced atomic layer deposition (PEALD) process. A ~10-nm-thick WNxCylayer enablesVTP(threshold voltage of pFETs) tunability up to 500 mV, while TiN is used as work function metal (WFM) for nFETs. The dual-WFM split-gate architecture achieves well-balanced threshold voltages, with a$\vert \textit{V}_{\text{TP}}\vert$/$\vert \textit{V}_{\text{TN}}\vert$ratio of 0.93. Furthermore, the CFET inverter with dual WFMs and split gate reaches a record-high voltage gain of 61 V/V among reported monolithic nanosheet CFETs.

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