A novel CFD-DPM model for particle deposition and removal in microchannels with different contact angles

Le résumé fourni par la source

Deposition of suspended particles hinders the development of nanofluids for microchannel cooling systems . Traditional discrete phase models (DPMs) only simulate particles moving towards the surface without considering surface conditions and the removal process. In order to accurately predict particle deposition for a microchannel design, a direct experimental method for real-time visualisation of particle deposition and removal is presented, and a novel DPM was developed based on experimental data. Results show that particle deposition is reduced when the Reynolds number is increased, and the contact angle is decreased. When the Reynolds number is 0.003, the net deposition number increases from 26 to 76 as the contact angle changes from 80.3° to 102.3° after two hours. This new model was developed by dividing the initial particle deposition process into three stages: the first stage involves DPM; the second stage involves a new correlation between surface wettability and particle deposition; and the third stage involves a new correlation between particle removal and particle deposition. Therefore, the “Improved DPM” incorporates all stages, providing good agreement with experimental results.

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