Laminar-type gratings overcoated with carbon-based materials to enhance analytical sensitivity of flat-field emission spectrograph in the VUV region
Rattachement africain : jp. Niveau de preuve : code pays fourni par la source.
Le résumé fourni par la source
Laminar-type spherical diffraction gratings overcoated with carbon-based materials were designed, fabricated, and evaluated for the purpose of enhancing the analytical sensitivity of the flat-field spectrograph in a vacuum ultraviolet region of 35-110 eV. As the design benchmark for numerical calculations, diffraction efficiency (DE) and spectral flux, which are defined by the product of the DE and numerical aperture and correlate with the analytical sensitivity of the spectrograph, were used. To simplify the feasibility study on the overcoating effects, we assumed a laminar-type grating having a grating constant of 1/1000 mm and coated with a Au layer of 30.0 nm thickness and an incidence angle of 84.0°. The optimized groove depth and duty ratio were 30.0 nm and 0.3, respectively. In addition, the optimum thicknesses of the overcoating layer were 44, 46, 24, and 30 nm for B4C, C, diamond-like-carbon, and SiC, respectively. Based on these results, we have fabricated a varied-line-spacing holographic grating overcoated with B4C with a thickness of 47 nm. For the experimental evaluation, we used the light source of Mg-L and Al-L emissions excited by the electron beam generated from an electron microscope, an objective flat-field spectrograph, and a CCD imaging detector. The experimental results showed that the spectrograph employing a new grating overcoated with the B4C layer indicated almost the same spectral resolution and 2.9-4.2 times higher analytical sensitivity compared with those obtained with a previously designed Au-coated grating having a grating constant of 1/1200 mm and used at an incidence of 86.0°.
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Le contrôle bibliographique ouvert
DOI retrouvé dans Crossref DOI retrouvé ; titre concordant.
- Titre Crossref
- Laminar-type gratings overcoated with carbon-based materials to enhance analytical sensitivity of flat-field emission spectrograph in the VUV region
- Date Crossref
- 01/12/2023
- Éditeur
- AIP Publishing
- Type
- journal-article
Ce recoupement confirme des métadonnées liées au DOI. Il ne confirme ni la méthode ni les conclusions de l’étude, et il ne compte pas comme une seconde source scientifique indépendante.
Où se fait cette recherche
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JEOL (Japan) pays non établi dans la noticeEntreprise
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Tohoku University Institute of Multidisciplinary Research for Advanced Materials pays non établi dans la noticeUniversité ou école supérieure
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National Institutes for Quantum Science and Technology pays non établi dans la noticeStructure de recherche
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Osaka Metropolitan University pays non établi dans la noticeUniversité ou école supérieure
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Shimadzu (Japan) pays non établi dans la noticeEntreprise
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SA Business Unit pays non établi dans la noticeEntreprise
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Graduate School of Engineering Department of Chemical Biology pays non établi dans la noticeUniversité ou école supérieure
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Kansai Institute for Photon Science pays non établi dans la noticeStructure de recherche
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Device Department pays non établi dans la noticeInstitution
JEOL (Japan), Institute of Multidisciplinary Research for Advanced Materials — Tohoku University et National Institutes for Quantum Science and Technology, avec 6 autres affiliations.
Une affiliation ne permet pas de déduire la nationalité d’un auteur.