Corrigendum: Evidence of ion energy distribution shift in HiPIMS plasmas with positive pulse (2019 Plasma Sources Sci. Technol. 28 01LT03)

Le résumé fourni par la source

The deposition of a dense and void-free coating in complex geometries can be obtained with High Power Impulse Magnetron Sputtering (HiPIMS) by negatively biasing the substrate.This accelerates the incoming metal ions that consequently densify the film.However, a biased substrate can be a technical challenge for large objects that are generally kept grounded.HiPIMS with a positive voltage pulse after the main negative one is a potential alternative to be still fully investigated.In this letter, we report on the first measurements of a dominant population of energetic ions in HiPIMS with a positive pulse.Time-integrated energy distribution functions of the background gas ions (Ar + ) and target ions (Nb + ) are measured with and without the positive pulse.The peak of low energy ions at ∼2 eV is shown to disappear by varying the duration of a +50 V pulse.For a sufficiently long duration of 100 μs, energy peaks in the range of ∼30 eV are observed for both Ar + and Nb + .Negligible ion fluxes at the energies below 10 eV are measured for 250 μs, indicating an effective acceleration of ions towards the substrate.Time-resolved ion flux measurements provide insights on the positive pulse effect on the ion fluxes.

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