Effect of Ta on magnetic thicknesses of permalloy (Ni81Fe19) films

Le résumé fourni par la source

Effect of Ta and Cu seed layers, as well as Ta and Cu cap layers on the effective magnetic thickness of ultrathin permalloy (Ni 81 Fe 19 ) were experimentally investigated for magnetic random access memory applications. The films were deposited by magnetron sputtering. For a Ta/Ni 81 Fe 19 /Ta fundamental structure, Ta seed and Ta cap layers resulted in a loss of moment equivalent to a magnetically dead layer of thickness 1.6±0.2 nm. X-ray photoelectron spectroscopy shows that a chemical reaction takes place at the Ta/Ni 81 Fe 19 and Ni 81 Fe 19 /Ta interfaces, i.e. 2Ta + Ni = NiTa 2 , which is thermodynamically favourable. For the Cu/Ni 81 Fe 19 /Cu film, permalloy layers have hardly lost magnetic moment due to a lack of interface reactions in the Cu/Ni 81 Fe 19 interface and Ni 81 Fe 19 /Cu interface.

Ce résumé expose les affirmations des auteurs. BNTIC ne l’interprète pas comme une validation indépendante des résultats.