Design and fabrication of a non-periodic multilayer structure for dual-band reflection at 17.1 nm and 19.5 nm
Hanlin Wang, Tao Chen, Bowen Gong, Qian Liu et autres
A dual-band multilayer structure was designed and fabricated to achieve simultaneous reflection at 17.1 nm and 19.5 nm under near-normal incidence. The initial design was based on a periodic multilayer stack, which was subsequently optimized into a non-periodic configuration using a genetic …
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Optical Materials Express